Preparation of cross‐sectional transmission electron microscopy samples by electron beam lithography and reactive ion etching
作者:
J. T. Wetzel,
期刊:
Journal of Electron Microscopy Technique
(WILEY Available online 1989)
卷期:
Volume 11,
issue 1
页码: 62-69
ISSN:0741-0581
年代: 1989
DOI:10.1002/jemt.1060110108
出版商: Wiley Subscription Services, Inc., A Wiley Company
关键词: TEM sample preparation;VLSI;semiconductor processing;Defect analysis
数据来源: WILEY
摘要:
AbstractA cross‐sectional sample preparation technique is described that relies on lithographic and dry‐etching processing, thus avoiding metallographic polishing and ion milling. The method is capable of producing cross‐sectional transmission electron microscopy samples with a large amount of transparent area (1 μm × 2.5 mm) which allows the examination of many patterned test sites on the same sample from the same chip of a silicon wafer. An example of the application of the technique is given for localized oxidation through
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