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Absolute photoyield from chemical vapor-deposited diamond and diamond-like carbon films in the UV

 

作者: A. Breskin,   R. Chechik,   E. Shefer,   D. Bacon,   Y. Avigal,   R. Kalish,   Y. Lifshitz,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 70, issue 25  

页码: 3446-3448

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.119197

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The absolute photoyields of chemical vapor deposited (CVD) diamond and amorphous hydrogen-free diamondlike carbon (DLC) films, in the range of 140–300 nm, are reported. CVD diamond films exhibit a large photoyield, of a few percent in the range 140–180 nm. DLC films have a 20–50 times lower yield. Post growth hydrogenation is found to substantially increase the photoyield of CVD diamond films. We discuss the applicability of these films as UV photocathodes coupled to electron multipliers based on gaseous charge multiplication. ©1997 American Institute of Physics.

 

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