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Spatial period division with synchrotron radiation bandwidth control by W/Be multilayer mirror

 

作者: Yuichi Utsumi,   Hakaru Kyuragi,   Tsuneo Urisu,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  （AIP Available online 1990）
卷期: Volume 8, issue 3  

页码: 436-438

 

ISSN:0734-211X

 

年代: 1990

 

DOI:10.1116/1.585040

 

出版商: American Vacuum Society

 

关键词: SYNCHROTRON RADIATION;FABRICATION;MASKING;SILICON;VLSI;MIRRORS;MULTILAYERS;WAFERS;LITHOGRAPHY;ETCHING;W;Be

 

数据来源: AIP

 

摘要:

Submicrometer periodic patterns were fabricated by spatial period division (SPD) using synchrotron radiation. The spectrum bandwidth was controlled to nearly the optimum width by using a W/Be multilayer mirror. This reduces the influence of gap variations between the x‐ray mask and the Si wafer.

 

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