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Emerging technology forinsituprocessing: Patterning alternatives

 

作者: D. J. Ehrlich,   J. G. Black,   M. Rothschild,   S. W. Pang,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  （AIP Available online 1988）
卷期: Volume 6, issue 3  

页码: 895-899

 

ISSN:0734-211X

 

年代: 1988

 

DOI:10.1116/1.584318

 

出版商: American Vacuum Society

 

关键词: IN−SITU PROCESSING;SEMICONDUCTOR DEVICES;LITHOGRAPHY;MICROELECTRONICS;FABRICATION

 

数据来源: AIP

 

摘要:

Insituprocessing methods would permit fabrication of semiconductor devices by simplified methods and without exposure of surfaces to air, liquids, or a processing atmosphere shared with human operators. The principal alternative patterning methods which would replace current lithography in such schemes are reviewed briefly.

 

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