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A molecular dynamics simulation study of the influence of the lattice atom potential function upon atom ejection processes

 

作者: Don E. Harrison,   Roger P. Webb,  

 

期刊: Journal of Applied Physics  (AIP Available online 1982)
卷期: Volume 53, issue 6  

页码: 4193-4201

 

ISSN:0021-8979

 

年代: 1982

 

DOI:10.1063/1.331243

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A molecular dynamics simulation has been used to investigate the sensitivity of atom ejection processes from a single‐crystal target to changes in the atom‐atom potential function. Four functions, three constructed from the Gibson potentials with Anderman’s attractive well, and a fourth specifically developed for this investigation, were investigated in the Cu/Ar+system over a range of ion energies from 1.0 to 10.0 kev with the KSE‐B ion‐atom potential. Well depths and widths also were varied. The calculations were done at normal incidence on the fcc (111) crystal orientation. Computed values were compared with experimental data where they exist. Sputtering yields, multimer yield ratios, layer yield ratios, and the ejected atom energy distribution vary systematically with the parameters of the atom‐atom potential function. Calculations also were done with the modified Moliere function. Yields and other properties fall exactly into the positions predicted from the Born‐Mayer function analysis. Simultaneous analysis of the ejected atom energy distribution and the ion energy dependence of the sputtering yield curve provides information about the parameters of both the wall and well portions of the atom‐atom potential function.

 

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