Generic scanned-probe microscope sensors by combined micromachining and electron-beam lithography
作者:
H. Zhou,
A. Midha,
G. Mills,
S. Thoms,
S. K. Murad,
J. M. R. Weaver,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1998)
卷期:
Volume 16,
issue 1
页码: 54-58
ISSN:1071-1023
年代: 1998
DOI:10.1116/1.589835
出版商: American Vacuum Society
数据来源: AIP
摘要:
We present a novel method for the fabrication of generic scanned-probe microscope probes by performing multiple level direct-write electron-beam lithography on the apex of micromachined atomic force microscope tips. Pattern transfer is by conventional etching or liftoff in a wide range of materials. Lithographic resolution is 50 nm or better. The substrates support the use of automatic alignment and allow for the fabrication of50 probes/in2.The integration of a force-sensing cantilever permits simple height regulation of the probes during operation. The technology is illustrated by the fabrication of thermocouple and near-field optical probes.
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