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Adsorption and desorption of sulfur on a GaAs (001) surface by H2S exposure and heat treatment

 

作者: Hidenori Kawanishi,   Yoshimasa Sugimoto,   Kenzo Akita,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  (AIP Available online 1991)
卷期: Volume 9, issue 3  

页码: 1535-1539

 

ISSN:1071-1023

 

年代: 1991

 

DOI:10.1116/1.585418

 

出版商: American Vacuum Society

 

关键词: HEAT TREATMENTS;ADSORPTION;DESORPTION;GALLIUM ARSENIDES;CRYSTAL FACES;PASSIVATION;AUGER ELECTRON SPECTROSCOPY;SURFACE STRUCTURE;HYDROGEN SULFIDES;SULFUR

 

数据来源: AIP

 

摘要:

The adsorption and desorption of sulfur on a GaAs (001) surface was studied usinginsituAuger electron spectroscopy and reflection high‐energy electron diffraction (RHEED). The H2S ‐treated surface showed a (2×1) sulfur‐terminated structure, with the sulfur considered to be a few monolayers thick. RHEED patterns showed that the (2×1) reconstruction changed into an arsenic‐stabilized (2×4) structure when heated to 590 °C under an arsenic flux. A sulfur Auger signal on the H2S ‐treated surface was found to completely dissapear upon heating. These data show that H2S exposure is appropriate for preparing a sulfur‐terminated surface and that high‐quality crystal regrowth is possible on the surface after being heat treated.

 

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