Adsorption and desorption of sulfur on a GaAs (001) surface by H2S exposure and heat treatment
作者:
Hidenori Kawanishi,
Yoshimasa Sugimoto,
Kenzo Akita,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1991)
卷期:
Volume 9,
issue 3
页码: 1535-1539
ISSN:1071-1023
年代: 1991
DOI:10.1116/1.585418
出版商: American Vacuum Society
关键词: HEAT TREATMENTS;ADSORPTION;DESORPTION;GALLIUM ARSENIDES;CRYSTAL FACES;PASSIVATION;AUGER ELECTRON SPECTROSCOPY;SURFACE STRUCTURE;HYDROGEN SULFIDES;SULFUR
数据来源: AIP
摘要:
The adsorption and desorption of sulfur on a GaAs (001) surface was studied usinginsituAuger electron spectroscopy and reflection high‐energy electron diffraction (RHEED). The H2S ‐treated surface showed a (2×1) sulfur‐terminated structure, with the sulfur considered to be a few monolayers thick. RHEED patterns showed that the (2×1) reconstruction changed into an arsenic‐stabilized (2×4) structure when heated to 590 °C under an arsenic flux. A sulfur Auger signal on the H2S ‐treated surface was found to completely dissapear upon heating. These data show that H2S exposure is appropriate for preparing a sulfur‐terminated surface and that high‐quality crystal regrowth is possible on the surface after being heat treated.
点击下载:
PDF
(550KB)
返 回