The refraction correction for the Fica 50 type of light scattering photometer
作者:
Hidematsu Suzuki,
Yoichior Muraoka,
Hiroshi Inagaki,
期刊:
British Polymer Journal
(WILEY Available online 1980)
卷期:
Volume 12,
issue 1
页码: 31-35
ISSN:0007-1641
年代: 1980
DOI:10.1002/pi.4980120107
出版商: John Wiley&Sons, Ltd
数据来源: WILEY
摘要:
AbstractThe factor for the refraction correction was considered for the Fica 50 type of light scattering photometer, in which the scattered light is twice refracted before reaching the detector. The correction factor was first calculated after Hermans and Levinson, which elucidated that the factor is just the same as for the Brice type of photometer, and a vat liquid has no further effects on the final form of the correction factor. This result was examined and found to be practically applicable to a Fica 50 photometer by measuring the scattering intensities of several liquids and the RAPRA PS2 standard polystyrene in solvents of varying refractive index.
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