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New ultrafast switching mechanism in semiconductor heterostructures

 

作者: K. Hess,   T. K. Higman,   M. A. Emanuel,   J. J. Coleman,  

 

期刊: Journal of Applied Physics  (AIP Available online 1986)
卷期: Volume 60, issue 10  

页码: 3775-3777

 

ISSN:0021-8979

 

年代: 1986

 

DOI:10.1063/1.337540

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A new switching mechanism in a two‐terminal semiconductor heterolayer structure is proposed which capitalizes on nonlinear electron temperature effects in adjacent heterolayers. The estimated switching speed of an optimized heterostructure hot electron diode should be extremely fast, perhaps as fast as 200 fs. Data are presented on prototype devices which show the expected negative differential resistance and indicate that the basic physical model is correct.

 

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