Thick stress-free amorphous-tetrahedral carbon films with hardness near that of diamond
作者:
T. A. Friedmann,
J. P. Sullivan,
J. A. Knapp,
D. R. Tallant,
D. M. Follstaedt,
D. L. Medlin,
P. B. Mirkarimi,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 71,
issue 26
页码: 3820-3822
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.120515
出版商: AIP
数据来源: AIP
摘要:
We have developed a process for making thick, stress-free, amorphous-tetrahedrally bonded carbon(a-tC)films with hardness and stiffness near that of diamond. Using pulsed-laser deposition, thina-tCfilms (0.1–0.2 &mgr;m) were deposited at room temperature. The intrinsic stress in these films (6–8 GPa) was relieved by a short (2 min) anneal at 600 °C. Raman and electron energy-loss spectra from single-layer annealed specimens show only subtle changes from as-grown films. Subsequent deposition and annealing steps were used to build up thick layers. Films up to 1.2 &mgr;m thick have been grown that are adherent to the substrate and have low residual compressive stress(<0.2 GPa).The values of hardness and modulus determined directly from an Oliver–Pharr analysis of nanoindentation experimental data were 80.2 and 552 GPa, respectively. We used finite-element modeling of the experimental nanoindentation curves to separate the “intrinsic” film response from the measured substrate/film response. We found a hardness of 88 GPa and Young’s modulus of 1100 GPa. From these fits, a lower bound on the compressive yield stress of diamond(∼100 GPa)was determined. ©1997 American Institute of Physics.
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