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Thick stress-free amorphous-tetrahedral carbon films with hardness near that of diamond

 

作者: T. A. Friedmann,   J. P. Sullivan,   J. A. Knapp,   D. R. Tallant,   D. M. Follstaedt,   D. L. Medlin,   P. B. Mirkarimi,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 71, issue 26  

页码: 3820-3822

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.120515

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have developed a process for making thick, stress-free, amorphous-tetrahedrally bonded carbon(a-tC)films with hardness and stiffness near that of diamond. Using pulsed-laser deposition, thina-tCfilms (0.1–0.2 &mgr;m) were deposited at room temperature. The intrinsic stress in these films (6–8 GPa) was relieved by a short (2 min) anneal at 600 °C. Raman and electron energy-loss spectra from single-layer annealed specimens show only subtle changes from as-grown films. Subsequent deposition and annealing steps were used to build up thick layers. Films up to 1.2 &mgr;m thick have been grown that are adherent to the substrate and have low residual compressive stress(<0.2 GPa).The values of hardness and modulus determined directly from an Oliver–Pharr analysis of nanoindentation experimental data were 80.2 and 552 GPa, respectively. We used finite-element modeling of the experimental nanoindentation curves to separate the “intrinsic” film response from the measured substrate/film response. We found a hardness of 88 GPa and Young’s modulus of 1100 GPa. From these fits, a lower bound on the compressive yield stress of diamond(∼100 GPa)was determined. ©1997 American Institute of Physics.

 

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