Texture and Anisotropy in Silicon Nitride
作者:
Farnjeng Lee,
Keith J. Bowman,
期刊:
Journal of the American Ceramic Society
(WILEY Available online 1992)
卷期:
Volume 75,
issue 7
页码: 1748-1755
ISSN:0002-7820
年代: 1992
DOI:10.1111/j.1151-2916.1992.tb07192.x
出版商: Blackwell Publishing Ltd
关键词: texture;anisotropy;silicon nitride;hot‐pressing;fracture toughness
数据来源: WILEY
摘要:
In this investigation quantitative texture analysis, including calculation of the orientation distribution function, is used to demonstrate the degree of preferred orientation inβ‐Si3N4which has been hot‐pressed or hot‐worked. The results indicate that plane strain compression can produce strong textures. The texture is decided by the processing parameters including temperature, sintering additives, and stress state. Grain rotation and preferred grain growth apparently both contribute to texture development inβ‐Si3N4. Basal (00l) pole figures obtained from the orientation distribution function are consistent with microstructural observations and are reflected in indentation fracture toughness anisotropy. In plane strain the ratio of maximum to minimum fracture toughness is great
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