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Texture and Anisotropy in Silicon Nitride

 

作者: Farnjeng Lee,   Keith J. Bowman,  

 

期刊: Journal of the American Ceramic Society  (WILEY Available online 1992)
卷期: Volume 75, issue 7  

页码: 1748-1755

 

ISSN:0002-7820

 

年代: 1992

 

DOI:10.1111/j.1151-2916.1992.tb07192.x

 

出版商: Blackwell Publishing Ltd

 

关键词: texture;anisotropy;silicon nitride;hot‐pressing;fracture toughness

 

数据来源: WILEY

 

摘要:

In this investigation quantitative texture analysis, including calculation of the orientation distribution function, is used to demonstrate the degree of preferred orientation inβ‐Si3N4which has been hot‐pressed or hot‐worked. The results indicate that plane strain compression can produce strong textures. The texture is decided by the processing parameters including temperature, sintering additives, and stress state. Grain rotation and preferred grain growth apparently both contribute to texture development inβ‐Si3N4. Basal (00l) pole figures obtained from the orientation distribution function are consistent with microstructural observations and are reflected in indentation fracture toughness anisotropy. In plane strain the ratio of maximum to minimum fracture toughness is great

 

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