Apparatus for producing controlled positive or negative corona discharge for semiconductor materials processing
作者:
Douglas N. Modlin,
William A. Tiller,
期刊:
Review of Scientific Instruments
(AIP Available online 1984)
卷期:
Volume 55,
issue 9
页码: 1433-1441
ISSN:0034-6748
年代: 1984
DOI:10.1063/1.1137954
出版商: AIP
数据来源: AIP
摘要:
An apparatus capable of producing current or voltage controlled positive and negative ion beams in 1‐atm oxidizing and nonoxidizing ambients between 25° and 950 °C is presented. The apparatus utilizes a point‐to‐plane corona discharge in the gas phase. Room‐temperature experiments revealed that the small differences in ion beam shape between the two polarities is primarily due to the difference in applied voltage required to produce the same current for the two polarities. Due to increased ion mobility and decreased threshold voltage at higher temperatures, a slight broadening of the ion beam current‐density profiles for both positive and negative ions is predicted.
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