Plasma deposition of amorphous SiC:H,F alloys from SiF4‐CH4‐H2mixtures under modulated conditions
作者:
G. Cicala,
P. Capezzuto,
G. Bruno,
L. Schiavulli,
G. Amato,
期刊:
Journal of Applied Physics
(AIP Available online 1996)
卷期:
Volume 79,
issue 11
页码: 8856-8858
ISSN:0021-8979
年代: 1996
DOI:10.1063/1.362473
出版商: AIP
数据来源: AIP
摘要:
Fluorinated and hydrogenated amorphous silicon‐carbon alloys (a‐SiC:H,F) are produced by glow discharge decomposition of SiF4‐CH4‐H2mixture. Small amount of CH4in SiF4‐H2mixture are enough to produce silicon carbon alloys having optical gap ranging between 1.8 and 2.6 eV. Materials, having 1.95 eV band gap and exhibiting optoelectronic properties typical of state of arta‐SiC:H, are deposited under plasma modulation conditions. ©1996 American Institute of Physics.
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