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Degradation mechanism of AlGaAs/GaAs laser diodes grown on Si substrates

 

作者: T. Egawa,   Y. Hasegawa,   T. Jimbo,   M. Umeno,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 67, issue 20  

页码: 2995-2997

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.114930

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have studied the rapid degradation of the AlGaAs/GaAs single quantum well laser diodes on Si substrates grown by metalorganic chemical vapor deposition. The dislocations propagate at velocities up to ∼75 &mgr;m/h along ⟨100⟩ and ∼20 &mgr;m/h along ⟨110⟩, which cause an increase in threshold current and a decrease in differential quantum efficiency. The degraded current–voltage characteristic resulted from the defect‐assisted impurity diffusion. The degradation process occurs very rapidly due to the presence of a high density of defects and thermally induced strain. ©1995 American Institute of Physics.

 

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