Degradation mechanism of AlGaAs/GaAs laser diodes grown on Si substrates
作者:
T. Egawa,
Y. Hasegawa,
T. Jimbo,
M. Umeno,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 67,
issue 20
页码: 2995-2997
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.114930
出版商: AIP
数据来源: AIP
摘要:
We have studied the rapid degradation of the AlGaAs/GaAs single quantum well laser diodes on Si substrates grown by metalorganic chemical vapor deposition. The dislocations propagate at velocities up to ∼75 &mgr;m/h along 〈100〉 and ∼20 &mgr;m/h along 〈110〉, which cause an increase in threshold current and a decrease in differential quantum efficiency. The degraded current–voltage characteristic resulted from the defect‐assisted impurity diffusion. The degradation process occurs very rapidly due to the presence of a high density of defects and thermally induced strain. ©1995 American Institute of Physics.
点击下载:
PDF
(137KB)
返 回