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Removal of OH groups from silica surfaces under mild conditions

 

作者: Bruno R. Guidotti,   Walter R. Caseri,   Peter Neuenschwander,   Ulrich W. Suter,  

 

期刊: Composite Interfaces  （Taylor Available online 1993）
卷期: Volume 1, issue 5  

页码: 429-437

 

年代: 1993

 

DOI:10.1163/156855493X00275

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

Hydroxyl groups on silica surfaces can be removed partially or completely under mild conditions, including washing of silica with dry hexane, prolonged storage over phosphorous pentoxide, chemical reaction with phenyl isocyanate, ethyl isocyanate or trimethylsilyl trifluoromethanesulfonate. The removal of these hydroxyl groups was performed at much lower temperatures than usually required for this process.

 

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