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Analysis and optimization of force sensitivity in atomic force microscopy using optical and electrical detection

 

作者: Francis Ho,   Yoshihisa Yamamoto,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  (AIP Available online 1998)
卷期: Volume 16, issue 1  

页码: 43-50

 

ISSN:1071-1023

 

年代: 1998

 

DOI:10.1116/1.589827

 

出版商: American Vacuum Society

 

数据来源: AIP

 

摘要:

Atomic force microscopy is a versatile tool for ultrasensitive measurement. We explore the fundamental and practical limits to force sensitivity that are imposed by optical and electrical deflection sensing techniques, and present a method for designing cantilevers to optimize force sensitivity. We calculate the optimized force sensitivity to be1.2×10−18  N/ Hzat a temperature of 4 K, using a gallium arsenide piezoresistive cantilever with dimensionsw=0.1  μm,t=0.1  μm, andL=81  μm, and mechanical quality factorQ=104. The optimized force sensitivities obtained using silicon piezoresistive and optical detection are not far behind.

 

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