Analysis and optimization of force sensitivity in atomic force microscopy using optical and electrical detection
作者:
Francis Ho,
Yoshihisa Yamamoto,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1998)
卷期:
Volume 16,
issue 1
页码: 43-50
ISSN:1071-1023
年代: 1998
DOI:10.1116/1.589827
出版商: American Vacuum Society
数据来源: AIP
摘要:
Atomic force microscopy is a versatile tool for ultrasensitive measurement. We explore the fundamental and practical limits to force sensitivity that are imposed by optical and electrical deflection sensing techniques, and present a method for designing cantilevers to optimize force sensitivity. We calculate the optimized force sensitivity to be1.2×10−18 N/ Hzat a temperature of 4 K, using a gallium arsenide piezoresistive cantilever with dimensionsw=0.1 μm,t=0.1 μm, andL=81 μm, and mechanical quality factorQ=104. The optimized force sensitivities obtained using silicon piezoresistive and optical detection are not far behind.
点击下载:
PDF
(145KB)
返 回