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Texture analysis of Al/SiO2films deposited by a partially ionized beam

 

作者: D. B. Knorr,   T.‐M. Lu,  

 

期刊: Applied Physics Letters  (AIP Available online 1989)
卷期: Volume 54, issue 22  

页码: 2210-2212

 

ISSN:0003-6951

 

年代: 1989

 

DOI:10.1063/1.101126

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The preferred crystallographic orientation, or texture, of aluminum films deposited on oxidized silicon by evaporation and by partially ionized beam (PIB) deposition is studied. Texture is quantified by the x‐ray diffraction pole figure technique. The pole figures reveal important details of the crystallite distribution not quantifiable by simply taking the 2&thgr; scan. It is found that the films deposited by the PIB technique possess a very strong {111} fiber texture whose strength can be controlled by deposition conditions. Correlation between the strength of the texture and the electromigration lifetime is discussed.

 

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