Texture analysis of Al/SiO2films deposited by a partially ionized beam
作者:
D. B. Knorr,
T.‐M. Lu,
期刊:
Applied Physics Letters
(AIP Available online 1989)
卷期:
Volume 54,
issue 22
页码: 2210-2212
ISSN:0003-6951
年代: 1989
DOI:10.1063/1.101126
出版商: AIP
数据来源: AIP
摘要:
The preferred crystallographic orientation, or texture, of aluminum films deposited on oxidized silicon by evaporation and by partially ionized beam (PIB) deposition is studied. Texture is quantified by the x‐ray diffraction pole figure technique. The pole figures reveal important details of the crystallite distribution not quantifiable by simply taking the 2&thgr; scan. It is found that the films deposited by the PIB technique possess a very strong {111} fiber texture whose strength can be controlled by deposition conditions. Correlation between the strength of the texture and the electromigration lifetime is discussed.
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