首页   按字顺浏览 期刊浏览 卷期浏览 Application of factor analysis to Auger crater‐edge profiling
Application of factor analysis to Auger crater‐edge profiling

 

作者: C. Gatts,   W. Losch,  

 

期刊: Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films  （AIP Available online 1991）
卷期: Volume 9, issue 6  

页码: 2982-2985

 

ISSN:0734-2101

 

年代: 1991

 

DOI:10.1116/1.577159

 

出版商: American Vacuum Society

 

关键词: PALLADIUM;SILANES;DEPTH PROFILES;AUGER ELECTRON SPECTROSCOPY;SPATIAL RESOLUTION;MULTILAYERS;Pd;Si:H

 

数据来源: AIP

 

摘要:

Factor analysis is applied to the Auger crater‐edge profile of a palladium/hydrogenated amorphous silicon layered structure. The results show, apart of a considerable improvement in interface determination, new information not obtainable by the conventional Auger depth profiling technique, which makes this procedure extremely useful for thin film depth profiling.

 

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