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A penning type ion source with high efficiency and some applications

 

作者: V. Alexander,   J. Linders,   H.-J. Lippold,   H. Niedrig,   T. Sebald,  

 

期刊: Radiation Effects  （Taylor Available online 1982）
卷期: Volume 59, issue 3-4  

页码: 183-189

 

ISSN:0033-7579

 

年代: 1982

 

DOI:10.1080/00337578208237501

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

A Penning type ion source has been developed for the application in definite sputtering experiments and surface etching. The source produces ion currents up to 200μA for energies between 2.5 and 50keV. By electrostatic ion optics the beam diameter can be varied From 0.3 to 20 mm by changing the focusing conditions.

 

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