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Unbalanced potential discharge characteristics for opposed‐targets sputtering system

 

作者: Morito Matsuoka,   Yoichi Hoshi,   Masahiko Naoe,  

 

期刊: Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films  (AIP Available online 1987)
卷期: Volume 5, issue 1  

页码: 52-56

 

ISSN:0734-2101

 

年代: 1987

 

DOI:10.1116/1.574136

 

出版商: American Vacuum Society

 

关键词: SPUTTERING;ELECTRIC DISCHARGES;TARGETS;ELECTRIC FIELDS;MAGNETIC FIELDS;FOCUSING;THIN FILMS;FILM GROWTH;OPERATION;DEPOSITION

 

数据来源: AIP

 

摘要:

In the opposed‐targets sputtering system (OTSS), plasma is focused in the space between opposed targets by magnetic and electric fields. Usually, since an equal potential is applied to the targets, the discharge is in the balanced potential mode. In this study, unbalanced potential (UP) modes of discharge characteristics are investigated for the OTSS. Discharge characteristics strongly depend on the unbalanced voltage applied to the opposed targets. UP is seen to promote strong ionization just as the plasma confinement field and other discharge parameters do.

 

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