Unbalanced potential discharge characteristics for opposed‐targets sputtering system
作者:
Morito Matsuoka,
Yoichi Hoshi,
Masahiko Naoe,
期刊:
Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films
(AIP Available online 1987)
卷期:
Volume 5,
issue 1
页码: 52-56
ISSN:0734-2101
年代: 1987
DOI:10.1116/1.574136
出版商: American Vacuum Society
关键词: SPUTTERING;ELECTRIC DISCHARGES;TARGETS;ELECTRIC FIELDS;MAGNETIC FIELDS;FOCUSING;THIN FILMS;FILM GROWTH;OPERATION;DEPOSITION
数据来源: AIP
摘要:
In the opposed‐targets sputtering system (OTSS), plasma is focused in the space between opposed targets by magnetic and electric fields. Usually, since an equal potential is applied to the targets, the discharge is in the balanced potential mode. In this study, unbalanced potential (UP) modes of discharge characteristics are investigated for the OTSS. Discharge characteristics strongly depend on the unbalanced voltage applied to the opposed targets. UP is seen to promote strong ionization just as the plasma confinement field and other discharge parameters do.
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