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Growth and carrier concentration control of Hg1−xCdxTe heterostructures using isothermal vapor phase epitaxy and vapor phase epitaxy techniques

 

作者: S. B. Lee,   D. Kim,   D. A. Stevenson,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  (AIP Available online 1991)
卷期: Volume 9, issue 3  

页码: 1639-1645

 

ISSN:1071-1023

 

年代: 1991

 

DOI:10.1116/1.585437

 

出版商: American Vacuum Society

 

关键词: MERCURY TELLURIDES;CADMIUM TELLURIDES;HETEROSTRUCTURES;VPE;MONOCRYSTALS;ELECTRICAL PROPERTIES;CARRIER DENSITY;MOBILITY;SOLID STRUCTURE;PHOTODIODES;MORPHOLOGY

 

数据来源: AIP

 

摘要:

We report on the growth and characterization of mercury cadmium telluride (MCT) heterostructures grown by isothermal vapor phase epitaxy (ISOVPE) and vapor phase epitaxy (VPE). This report consists of the use of both ISOVPE and VPE methods for growing wider band gap MCT on narrow band gap MCT, the compositional and structural characterization of as‐grown layers, and the use of two zone Hg ampoules for carrier concentration control. The crystal perfection of some heterostructures is as good as that of the ISOVPE‐grown layers. The carrier concentrations and mobilities of the ISOVPE‐grown layers are substantially improved by a two zone Hg annealing technique.

 

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