Quantum mechanical tunneling in an ohmic contact
作者:
J. Crofton,
P. A. Barnes,
M. J. Bozack,
期刊:
American Journal of Physics
(AIP Available online 1992)
卷期:
Volume 60,
issue 6
页码: 499-502
ISSN:0002-9505
年代: 1992
DOI:10.1119/1.16861
出版商: American Association of Physics Teachers
关键词: TUNNELING;GALLIUM ARSENIDES;DEPLETION LAYER;DOPED MATERIALS;WORK FUNCTIONS;POTENTIALS;QUANTUM MECHANICS;POTENTIAL BARRIER;OHMIC CONTACTS;VLSI
数据来源: AIP
摘要:
The tunneling probability for majority carriers in an ohmic contact ton‐type GaAs has been calculated by directly solving the Schrödinger equation for the wave functions in the semiconductor depletion region. The direct solution is straightforward and relies on fewer assumptions than previous calculations based on the WKB approximation. It also provides a useful application of undergraduate quantum mechanics to an important area of VLSI semiconductor technology. The direct solution can be performed on an 80286 machine in less than a minute and yields tunneling probabilities roughly twice as large as the WKB approximation at most electron energies. The tunneling probability is then used to calculate the contact resistance as a function of doping for the contact. The contact resistances are approximately one‐half the resistances calculated using the WKB method.
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