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Quantum mechanical tunneling in an ohmic contact

 

作者: J. Crofton,   P. A. Barnes,   M. J. Bozack,  

 

期刊: American Journal of Physics  (AIP Available online 1992)
卷期: Volume 60, issue 6  

页码: 499-502

 

ISSN:0002-9505

 

年代: 1992

 

DOI:10.1119/1.16861

 

出版商: American Association of Physics Teachers

 

关键词: TUNNELING;GALLIUM ARSENIDES;DEPLETION LAYER;DOPED MATERIALS;WORK FUNCTIONS;POTENTIALS;QUANTUM MECHANICS;POTENTIAL BARRIER;OHMIC CONTACTS;VLSI

 

数据来源: AIP

 

摘要:

The tunneling probability for majority carriers in an ohmic contact ton‐type GaAs has been calculated by directly solving the Schrödinger equation for the wave functions in the semiconductor depletion region. The direct solution is straightforward and relies on fewer assumptions than previous calculations based on the WKB approximation. It also provides a useful application of undergraduate quantum mechanics to an important area of VLSI semiconductor technology. The direct solution can be performed on an 80286 machine in less than a minute and yields tunneling probabilities roughly twice as large as the WKB approximation at most electron energies. The tunneling probability is then used to calculate the contact resistance as a function of doping for the contact. The contact resistances are approximately one‐half the resistances calculated using the WKB method.

 

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