首页   按字顺浏览 期刊浏览 卷期浏览 Analyzing atomic force microscopy images using spectral methods
Analyzing atomic force microscopy images using spectral methods

 

作者: S. J. Fang,   S. Haplepete,   W. Chen,   C. R. Helms,   Hal Edwards,  

 

期刊: Journal of Applied Physics  (AIP Available online 1997)
卷期: Volume 82, issue 12  

页码: 5891-5898

 

ISSN:0021-8979

 

年代: 1997

 

DOI:10.1063/1.366489

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Various statistical quantities (such as average, peak-to-valley, and root-mean-square roughness) have been applied to characterize surface topography. However, they provide only vertical information. Because spectral analysis provides both lateral and longitudinal information, it is a more informative measurement than all these commonly used statistical quantities. Unfortunately, a standard method to calculate power spectral density (PSD) is not available. For example, the dimensions of PSD are often denoted as either (length)3 or (length)4. This may lead to confusion when utilizing spectral analysis to study surface morphology. In this paper, we will first compare the definitions of PSD commonly used by various authors. Using silicon surface roughness measurements as examples, we will demonstrate the advantages of spectral methods on atomic force microscopic (AFM) image analysis. In this context, we study the effects of typical AFM imaging distortions such as image bow, drift, tip-shape effects, and acoustic noise. As a result, we will provide a procedure to obtain accurate and reproducible AFM measurements. ©1997 American Institute of Physics.

 

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