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Method for simultaneously reducing the misalignment offset and separating the Hall voltage from the off‐diagonal piezoresistive voltage in Hall effect and piezoresistive devices based on silicon

 

作者: R. G. Mani,   K. von Klitzing,   F. Jost,   K. Marx,   S. Lindenkreuz,   H. P. Trah,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 67, issue 15  

页码: 2223-2225

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.115110

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A novel misalignment offset reduction technique is extended in order to separate a piezoresistive voltage, from the Hall voltage, in doubly connected Hall elements based on silicon. In a special configuration, this method exploits directional averaging using biaxial current injection from four electrically separate current sources in order to cancelinsituthe stress‐generated off‐diagonal piezoresistive voltage across the Hall voltage contacts. Measurements suggest field‐equivalent offsets below 1 mT in (001) surfacen‐Si devices with current injection in the [110] direction. ©1995 American Institute of Physics.

 

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