Method for simultaneously reducing the misalignment offset and separating the Hall voltage from the off‐diagonal piezoresistive voltage in Hall effect and piezoresistive devices based on silicon
作者:
R. G. Mani,
K. von Klitzing,
F. Jost,
K. Marx,
S. Lindenkreuz,
H. P. Trah,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 67,
issue 15
页码: 2223-2225
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.115110
出版商: AIP
数据来源: AIP
摘要:
A novel misalignment offset reduction technique is extended in order to separate a piezoresistive voltage, from the Hall voltage, in doubly connected Hall elements based on silicon. In a special configuration, this method exploits directional averaging using biaxial current injection from four electrically separate current sources in order to cancelinsituthe stress‐generated off‐diagonal piezoresistive voltage across the Hall voltage contacts. Measurements suggest field‐equivalent offsets below 1 mT in (001) surfacen‐Si devices with current injection in the [110] direction. ©1995 American Institute of Physics.
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