An experimental variable shaped electron beam lithography system
作者:
Fu‐min He,
Chun‐lan Lin,
Guan‐rong Fang,
Li‐ming Wang,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena
(AIP Available online 1985)
卷期:
Volume 3,
issue 1
页码: 121-123
ISSN:0734-211X
年代: 1985
DOI:10.1116/1.583192
出版商: American Vacuum Society
关键词: BEAM OPTICS;ELECTRON BEAMS;BEAM PRODUCTION;BEAM SHAPING;LITHOGRAPHY
数据来源: AIP
摘要:
An experimental variable shaped electron beam lithography system has been built to verify the theoretical design considerations and fundamental control method. The electron beam column consists of four magnetic lenses, two square apertures, two aligners, an angular aperture, a set of blanking plates, and a position deflection yoke. The size of the beam spot is varied by a set of electrostatic deflection plates. In order to maintain the current density in the spot constant, as the size of the beam spot varies, the center of the shaped deflection plates is placed to coincide with the image of the gun crossover, and the shaped deflection plates position can be electrically adjusted. The acceleration voltage is 20 kV. The field size is 2.5 mm square. The maximum spot size is 10 μm2. The maximum current density is 1 A/cm2. The system is controlled by an EG 3003 computer. The beam blanking switching time is 50 nS.
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