Diffusive base transport in narrow base InP/Ga0.47In0.53As heterojunction bipolar transistors
作者:
D. Ritter,
R. A. Hamm,
A. Feygenson,
M. B. Panish,
S. Chandrasekhar,
期刊:
Applied Physics Letters
(AIP Available online 1991)
卷期:
Volume 59,
issue 26
页码: 3431-3433
ISSN:0003-6951
年代: 1991
DOI:10.1063/1.105698
出版商: AIP
数据来源: AIP
摘要:
The common emitter current gain of InP/Ga0.47In0.53As heterojunction bipolar transitors having a base doping level of 7×1019cm−3is found to increase monotonically with decreasing base thickness in the range of 200–1000 A˚. The variation of the gain with base thicknessWBis proportional to 1×W2B, as expected for diffusive base transport, and a high injection efficiency.
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