Effects of preferential sputtering and enhanced diffusion processes on the evolution of La‐implanted profile in Ni
作者:
V. N. Kulkarni,
A. Miotello,
期刊:
Journal of Applied Physics
(AIP Available online 1985)
卷期:
Volume 57,
issue 8
页码: 2977-2979
ISSN:0021-8979
年代: 1985
DOI:10.1063/1.335191
出版商: AIP
数据来源: AIP
摘要:
An experimental profile of La implanted in a Ni crystal is theoretically described on the basis of a continuity equation for the La concentration, which includes a diffusive relocation of the implanted atoms and the matrix erosion velocity. The La sputtering process is explicitly considered by an appropriate boundary condition. The shape of the experimental La profile as well as the measured retained La dose has been well reproduced. It is shown that the erosion velocity of La atoms is greater than that of Ni atoms by a factor of 2.
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