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Effects of preferential sputtering and enhanced diffusion processes on the evolution of La‐implanted profile in Ni

 

作者: V. N. Kulkarni,   A. Miotello,  

 

期刊: Journal of Applied Physics  (AIP Available online 1985)
卷期: Volume 57, issue 8  

页码: 2977-2979

 

ISSN:0021-8979

 

年代: 1985

 

DOI:10.1063/1.335191

 

出版商: AIP

 

数据来源: AIP

 

摘要:

An experimental profile of  La implanted in a Ni crystal is theoretically described on the basis of a continuity equation for the La concentration, which includes a diffusive relocation of the implanted atoms and the matrix erosion velocity. The La sputtering process is explicitly considered by an appropriate boundary condition. The shape of the experimental La profile as well as the measured retained La dose has been well reproduced. It is shown that the erosion velocity of La atoms is greater than that of Ni atoms by a factor of 2.

 

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