An Exposure Meter for the Electron Microscope
作者:
E. H. Frei,
F. L. Hirshfeld,
期刊:
Review of Scientific Instruments
(AIP Available online 1951)
卷期:
Volume 22,
issue 4
页码: 231-232
ISSN:0034-6748
年代: 1951
DOI:10.1063/1.1745897
出版商: AIP
数据来源: AIP
摘要:
A simple exposure meter has been developed which measures directly the beam current reaching the fluorescent viewing screen of the electron microscope. By its use, the characteristic curve of a Kodak lantern slide plate has been plotted at constant intensity of electron beam. The value of beam intensity given by the exposure meter is confirmed by direct counts of electron tracks in the developed emulsion.
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