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An Exposure Meter for the Electron Microscope

 

作者: E. H. Frei,   F. L. Hirshfeld,  

 

期刊: Review of Scientific Instruments  (AIP Available online 1951)
卷期: Volume 22, issue 4  

页码: 231-232

 

ISSN:0034-6748

 

年代: 1951

 

DOI:10.1063/1.1745897

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A simple exposure meter has been developed which measures directly the beam current reaching the fluorescent viewing screen of the electron microscope. By its use, the characteristic curve of a Kodak lantern slide plate has been plotted at constant intensity of electron beam. The value of beam intensity given by the exposure meter is confirmed by direct counts of electron tracks in the developed emulsion.

 

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