Since the demonstration of current densities above 10 A/cm2, emitted from ferroelectric ceramic material, at CERN in 1988,1there has been a quickly growing interest in the developement of such electron beam sources. Through thorough examination properties of the phenomenon were established which are different as compared to conventional source behaviour. The efficiency of emission from ferroelectrics is not affected by the quality of the vacuum; one may even profit by gas amplification due to avalanche processes in the low-pressure gas regime or operate the source in a plasma environment. Emission of high currents take place without the need of an external extraction voltage, moreover, the electrons have an initial kinetic energy of up to several keV. This is caused by the generation of an high electric field in the material when switching the ferroelectric in a nanosecond time scale. Thus the rate of polarization change determines the electron yield. The structure of the electrode grid at the emitting ferroelectic surface defines the geometry of the electron beam; microsources as well as large area emitters are possible. Basic characteristics of the FEBS were reviewed;2original literature is cited there, too. The kinetics of the emission process was investigated and found to be closely related to the switching dynamics in the ferroelectric, respectively. This includes partial switching processes and polarization changes induced by a fast phase transition from a non-polar to the ferroelectric state. Electric field calculations of a commonly used emitter geometry were performed and support the understanding of the phenomenon.3At present, in approximately 20 laboratories all over the world electron emission from ferroelectrics is object of research and development. In the beginning, main applications were anticipated in the area of high energy physics and accelerator technology as high brightness sources for power microwave tubes, x-ray generation, free electron lasers, and injectors for linear accelerators. More recently, increasing efforts are made to aim at emission from ferroelectric thin films. Consistent with this are applications in micro-electronics and vacuum-electronic devices such as micro-triodes and flat panel displays. Most advanced is the use of electron emission from ferroelectrics as a charge injection trigger which initializes closing of a high-power gas switch in pseudo-spark geometry, developed for the CERN Large Hadron Collider (LHC)4.