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A detailed Hall‐effect analysis of sulfur‐doped gallium antimonide grown by molecular‐beam epitaxy

 

作者: M. E. Lee,   I. Poole,   W. S. Truscott,   I. R. Cleverley,   K. E. Singer,   D. M. Rohlfing,  

 

期刊: Journal of Applied Physics  (AIP Available online 1990)
卷期: Volume 68, issue 1  

页码: 131-137

 

ISSN:0021-8979

 

年代: 1990

 

DOI:10.1063/1.347098

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Experimental data are presented for the Hall coefficient and the apparent Hall mobility over the temperature range 160–500 K for five samples of molecular‐beam epitaxially grown sulfur‐doped GaSb. The donor concentration of the different samples varied between 3.3×1017and 7.5×1016cm−3, and the native acceptor concentration between 8×1016and 1.2×1016cm−3. The samples show a large spread in the apparent carrier activation energy. A two valley compensated conduction model is presented that shows that the variation in apparent carrier activation energy results from different compensation ratios in the samples. This model also shows that the constant value of the Hall coefficient observed at high temperatures is not due to donor exhaustion but carrier promotion to the lower mobilityL1band. Using constraints provided by secondary ion mass spectrometry and capacitance‐voltage measurements on the samples, as well as growth data, it is shown that a narrow spread of values for the donor binding energy around 60 meV is required to account for the data. It is suggested that this spread is due to the formation of a donor band and to the strongly attractive central cores of the sulphur donors.

 

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