首页   按字顺浏览 期刊浏览 卷期浏览 End‐point detection by sputtered neutral mass spectrometry in ion milling of prepattern...
End‐point detection by sputtered neutral mass spectrometry in ion milling of prepatterned semiconductor and high‐Tcsuperconductor films

 

作者: Christian Jaekel,   Roland Barth,   Hartmut G. Roskos,   Heinrich Kurz,  

 

期刊: Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films  （AIP Available online 1994）
卷期: Volume 12, issue 5  

页码: 2830-2833

 

ISSN:0734-2101

 

年代: 1994

 

DOI:10.1116/1.578952

 

出版商: American Vacuum Society

 

关键词: SEMICONDUCTOR MATERIALS;HIGH−TC SUPERCONDUCTORS;CUPRATES;THIN FILMS;ETCHING;SPUTTERING;MASS SPECTRA;EV RANGE;KEV RANGE 01−10;YBa2Cu3O7

 

数据来源: AIP

 

摘要:

We explore the use of sputtered neutral mass spectrometry (SNMS) for semiconductor and superconductor device processing. SNMS allows us to precisely determine the end point at interfaces during sputter etching of prepatterned semiconductor and superconductor thin films. By postionizing the sputtered neutrals the detection sensitivity is similar for all elements. The dynamic range of up to three orders of magnitude makes precise end‐point detection possible even if the mask allows sputter etching of only a small fraction of the surface of the specimen.

 

点击下载:  PDF (315KB)



返 回