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High‐temperature annealing of semi‐insulating GaAs and the dissociation of EL2

 

作者: Richard A. Morrow,  

 

期刊: Journal of Applied Physics  (AIP Available online 1995)
卷期: Volume 78, issue 8  

页码: 5166-5167

 

ISSN:0021-8979

 

年代: 1995

 

DOI:10.1063/1.359749

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Existing data on then–ptype conversion of semi‐insulating GaAs during high temperature (1100–1200 °C) anneals are fit using a previously developed model in which EL2 is identified as the native defect AsGaVGa. In this model EL2 dissociates into the acceptor VGaand the donor AsGa. The latter defect then rapidly captures a divacancy to form the electrically neutral complex AsGaVAsVGa. The decrease in EL2 concentration, then–ptype conversion of GaAs, and the subsequent increase in hole concentration as the annealing temperature is increased are correlated in the model. ©1995 American Institute of Physics.

 

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