首页   按字顺浏览 期刊浏览 卷期浏览 Chemical sputtering of carbon by sub‐eV atomic hydrogen: New results and a critical com...
Chemical sputtering of carbon by sub‐eV atomic hydrogen: New results and a critical comparison with previous data relevant to fusion applications

 

作者: P. C. Stangeby,   O. Auciello,   A. A. Haasz,  

 

期刊: Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films  (AIP Available online 1983)
卷期: Volume 1, issue 3  

页码: 1425-1429

 

ISSN:0734-2101

 

年代: 1983

 

DOI:10.1116/1.572034

 

出版商: American Vacuum Society

 

关键词: hydrogen ions 1 plus;sputtering;carbon;surface cleaning;chemical reaction yield;synthesis;methane;collisions;ion collisions;kev range 01−10;high temperature;kev range 10−100;ev range 100−1000

 

数据来源: AIP

 

摘要:

The production of methane on carbon (papyex) surfaces under sub‐eV atomic hydrogen bombardment has been measured in an ultrahigh vacuum system subjected to special cleaning procedures. These results and previously published methane yield results are compared and their applicability to fusion technology is assessed. A critical analysis of the available data leads to the following conclusions: (i) The inconsistent methane yields spanning four orders of magnitude are most likely due to different experimental procedures. (ii) The monotonically decreasing methane yield as a function of sample temperature, obtained by some groups, is most probably due to the fact that deactivated surfaces were exposed to hydrogen bombardment. (iii) The methane yields which present a maximum at a certain temperature in the range 700–850 K resulted from bombardment of activated surfaces; and (iv) the shift in temperature at which the methane yield maximum occurs in the different studies may be due to temperature nonuniformities over the exposed surfaces and/or different states of activation.

 

点击下载:  PDF (370KB)



返 回