Influence of the barrier thickness on the noise performance of AlAs/GaAs/AlAs double barrier resonant tunneling diodes
作者:
A. Ouacha,
M. Willander,
H. Brugger,
U. Meiners,
期刊:
Journal of Applied Physics
(AIP Available online 1995)
卷期:
Volume 77,
issue 11
页码: 6026-6030
ISSN:0021-8979
年代: 1995
DOI:10.1063/1.359187
出版商: AIP
数据来源: AIP
摘要:
The noise characteristics of symmetrical double barrier resonant tunneling structures were measured in two samples with a fixed well width of 50 A˚ and barrier thicknesses ofLB=8 monolayer and 10 ML, respectively. The measurement was done in the frequency range of 1 Hz–100 kHz and temperature range of 77–300 K. The noise due to the excess current in the valley region, observed in both devices, was associated with defect assisted tunneling which is a two‐step process: generation‐recombination noise due to the trapping and detrapping mechanism, and 1/fnoise due to the scattering by phonons. The current dependence of 1/fnoise contribution was investigated in the resonant tunneling and valley regions. The frequency exponent of the 1/fnoise component was found to vary between 0.9–1.1 for double barrier resonant tunneling diode (DBRTD) withLB=8 ML and 1.1–1.2 for DBRTD withLB=10 ML. This noise investigation implies that there is a difference in the physics governing the transport between DBRTD withLB=8 ML and DBRTD withLB=10 ML. ©1995 American Institute of Physics.
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