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A shadow mask for sputtered films

 

作者: Frank W. Ingle,  

 

期刊: Review of Scientific Instruments  （AIP Available online 1974）
卷期: Volume 45, issue 11  

页码: 1460-1461

 

ISSN:0034-6748

 

年代: 1974

 

DOI:10.1063/1.1686529

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Use of a magnet to clamp a magnetic metal mask to the substrate during sputtering resulted in good edge definition in thin film patterns.

 

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