Two‐dimensional energy bands at the CaF2/Si(111) interface
作者:
F. J. Himpsel,
T. F. Heinz,
A. B. McLean,
E. Palange,
E. Burstein,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena
(AIP Available online 1989)
卷期:
Volume 7,
issue 4
页码: 879-881
ISSN:0734-211X
年代: 1989
DOI:10.1116/1.584617
出版商: American Vacuum Society
关键词: CALCIUM FLUORIDES;SILICON;TWO−DIMENSIONAL SYSTEMS;INTERFACES;BAND STRUCTURE;PHOTOEMISSION;PHOTOELECTRON SPECTROSCOPY;SECOND HARMONIC GENERATION;INTERFACE STRUCTURE;MEASURING METHODS;CaF2;Si
数据来源: AIP
摘要:
We have chosen CaF2/Si(111) as a prototype to study the two‐dimensional band structure of an ordered interface using angle‐resolved photoemission and optical second harmonic generation. A pair of interface state bands is found, one occupied, the other empty. The former disperses fromEF−0.8 eV at Γ toEF−1.4 eV (−1.6 eV) atM(K). An interface band gap of 2.4 eV is determined via resonant second harmonic generation using a truly buried interface with 500 Å of CaF2on top of Si. Therefore, the interfacial gap is twice as large as the gap in Si and five times smaller than the gap in CaF2. The pair of interface bands can be understood as bonding/antibonding combinations of the Si dangling bond orbital and the Ca 4sorbital, with Ca in the 1+oxidation state.
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