A far-ultraviolet contamination-irradiation facility forin situreflectance measurements
作者:
Steven R. Meier,
June L. Tveekrem,
Ritva A. M. Keski-Kuha,
期刊:
Review of Scientific Instruments
(AIP Available online 1998)
卷期:
Volume 69,
issue 10
页码: 3642-3644
ISSN:0034-6748
年代: 1998
DOI:10.1063/1.1149152
出版商: AIP
数据来源: AIP
摘要:
In this article, a contamination-irradiation facility designed to measure contamination effects on far-ultraviolet optical surfaces is described. An innovative feature of the facility is the capability of depositing a contaminant, photopolymerizing the contaminant with far-ultraviolet light, and measuring the reflectance of the contaminated sample, allin situ. In addition to describing the facility, we present far-ultraviolet reflectance measurements for a contaminated mirror. ©1998 American Institute of Physics.
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