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Aberrations due to localized potential defects (patch fields) on apertures

 

作者: F. H. Read,   L. A. Baranova,   N. J. Bowring,   J. Lambourne,   T. C. Whitwell,  

 

期刊: Review of Scientific Instruments  (AIP Available online 1998)
卷期: Volume 69, issue 1  

页码: 84-90

 

ISSN:0034-6748

 

年代: 1998

 

DOI:10.1063/1.1148482

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The aberrations coefficients are derived for electrostatic systems that are axially symmetric except for the presence of a localized potential defect (i.e., a patch field). The near-axis aberrations caused by such a defect near the edge of an aperture are then investigated. When a beam fills the aperture the resulting aberrations cannot be characterized in terms of coefficients, and so a new characterization of the aberrations is defined. Numerical evaluations are carried out for representative types of potential defect. Relationships are presented that enable the increase in spot size of a focused beam to be deduced from the measured or estimated mean deflection of the spot. ©1998 American Institute of Physics.

 

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