Aberrations due to localized potential defects (patch fields) on apertures
作者:
F. H. Read,
L. A. Baranova,
N. J. Bowring,
J. Lambourne,
T. C. Whitwell,
期刊:
Review of Scientific Instruments
(AIP Available online 1998)
卷期:
Volume 69,
issue 1
页码: 84-90
ISSN:0034-6748
年代: 1998
DOI:10.1063/1.1148482
出版商: AIP
数据来源: AIP
摘要:
The aberrations coefficients are derived for electrostatic systems that are axially symmetric except for the presence of a localized potential defect (i.e., a patch field). The near-axis aberrations caused by such a defect near the edge of an aperture are then investigated. When a beam fills the aperture the resulting aberrations cannot be characterized in terms of coefficients, and so a new characterization of the aberrations is defined. Numerical evaluations are carried out for representative types of potential defect. Relationships are presented that enable the increase in spot size of a focused beam to be deduced from the measured or estimated mean deflection of the spot. ©1998 American Institute of Physics.
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