Ultraviolet–ozone cleaning of silicon surfaces studied by Auger spectroscopy

 

作者: B. S. Krusor,   D. K. Biegelsen,   R. D. Yingling,   J. R. Abelson,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  （AIP Available online 1989）
卷期: Volume 7, issue 1  

页码: 129-130

 

ISSN:0734-211X

 

年代: 1989

 

DOI:10.1116/1.584436

 

出版商: American Vacuum Society

 

关键词: SURFACE CLEANING;AUGER ELECTRON SPECTROSCOPY;SILICA;MOLECULAR BEAM EPITAXY;SAMPLE PREPARATION;PASSIVATION;OXIDATION;VERY HIGH TEMPERATURE;SILICON;VAPOR DEPOSITED COATINGS;ULTRAVIOLET RADIATION;Si

 

数据来源: AIP

 

 

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