Implantation profile of low‐energy positrons in solids
作者:
P. Asoka‐Kumar,
K. G. Lynn,
期刊:
Applied Physics Letters
(AIP Available online 1990)
卷期:
Volume 57,
issue 16
页码: 1634-1636
ISSN:0003-6951
年代: 1990
DOI:10.1063/1.104071
出版商: AIP
数据来源: AIP
摘要:
A simple form for an implantation profile of monoenergetic, low‐energy (1–10 keV) positrons in solids is presented. Materials studied include aluminum, copper, molybdenum, palladium, and gold with atomic number ranging from 13 to 79. A simple set of parameters can describe the currently used Makhov profile in slow positron studies of solids. We provide curves and tables for the parameters that can be used to describe the implantation profiles of positrons in any material with atomic number in between 13 and 79.
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