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Implantation profile of low‐energy positrons in solids

 

作者: P. Asoka‐Kumar,   K. G. Lynn,  

 

期刊: Applied Physics Letters  (AIP Available online 1990)
卷期: Volume 57, issue 16  

页码: 1634-1636

 

ISSN:0003-6951

 

年代: 1990

 

DOI:10.1063/1.104071

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A simple form for an implantation profile of monoenergetic, low‐energy (1–10 keV) positrons in solids is presented. Materials studied include aluminum, copper, molybdenum, palladium, and gold with atomic number ranging from 13 to 79. A simple set of parameters can describe the currently used Makhov profile in slow positron studies of solids. We provide curves and tables for the parameters that can be used to describe the implantation profiles of positrons in any material with atomic number in between 13 and 79.

 

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