首页   按字顺浏览 期刊浏览 卷期浏览 Enhanced preferential sputtering of a hydrogenated barium surface
Enhanced preferential sputtering of a hydrogenated barium surface

 

作者: R. M. A. Heeren,   D. C´iric´,   H. J. Hopman,   A. W. Kleyn,  

 

期刊: Applied Physics Letters  (AIP Available online 1991)
卷期: Volume 59, issue 2  

页码: 158-160

 

ISSN:0003-6951

 

年代: 1991

 

DOI:10.1063/1.106005

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have observed a substantial decrease in barium sputter yield as a function of exposure time when a barium surface is bombarded with an intense flux of positive hydrogen or deuterium ions, extracted from a plasma. This effect is attributed to an increase of surface hydrogen concentration which results in enhanced preferential sputtering of hydrogen surface atoms. The sputtering process is observed by means of optical emission spectroscopy. Whenever the surface is saturated with hydrogen, the sputtered barium yield is constant in time, and scales with the sputter coefficient, which is dependent on the energy of the incident ions. The relative decrease of the sputtered barium yield is shown to scale with the incident positive ion current density as the saturation concentration depends on this current density.

 

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