Epitaxial growth of silicon by photochemical vapor deposition at a very low temperature of 200 °C
作者:
Shoji Nishida,
Tsunenori Shiimoto,
Akira Yamada,
Shiro Karasawa,
Makoto Konagai,
Kiyoshi Takahashi,
期刊:
Applied Physics Letters
(AIP Available online 1986)
卷期:
Volume 49,
issue 2
页码: 79-81
ISSN:0003-6951
年代: 1986
DOI:10.1063/1.97626
出版商: AIP
数据来源: AIP
摘要:
A novel Si epitaxial growth technique using mercury‐sensitized photochemical vapor deposition has been developed. Epitaxial thin films (300–8000 A˚) were grown on (100)Si substrates at 100–300 °C from a gas mixture of Si2H6+SiH2F2+H2by irradiation of a low pressure mercury lamp (1849,2537 A˚). The growth rate, plotted as a function of the reciprocal substrate temperature, represented an activation energy which was found to be a small value of 0.18 eV. Observation of the surface structure by reflective high‐energy electron diffraction showed fine (100) streak patterns for films grown at 200 °C as well as at 250 and 300 °C.
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