首页   按字顺浏览 期刊浏览 卷期浏览 Random walk calculation of diffusion coefficient of hot electrons in two‐valley ...
Random walk calculation of diffusion coefficient of hot electrons in two‐valley semiconductors

 

作者: Madhu S. Gupta,  

 

期刊: Journal of Applied Physics  (AIP Available online 1978)
卷期: Volume 49, issue 5  

页码: 2837-2844

 

ISSN:0021-8979

 

年代: 1978

 

DOI:10.1063/1.325164

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The electric‐field‐dependent longitudinal diffusion coefficient for charge carriers in a two‐valley semiconductor is calculated by modeling the carrier movement as two simultaneous coupled random walks. The first random walk represents carrier scattering from one valley to another, and the second describes the motion of a carrier within a single valley, with the carrier position in the first walk determining the parameters of the second walk. The calculated intervalley transfer diffusion coefficientDtrcontains earlier calculations ofDtras special cases. An agreement between calculated and measured low‐field diffusion coefficients for electrons inn‐GaAs at room temperature is obtained when the random time interval that a carrier spends in a valley is assumed to have a gamma distribution.

 

点击下载:  PDF (614KB)



返 回