p‐channel, strained quantum well, field‐effect transistor
作者:
T. J. Drummond,
T. E. Zipperian,
I. J. Fritz,
J. E. Schirber,
T. A. Plut,
期刊:
Applied Physics Letters
(AIP Available online 1986)
卷期:
Volume 49,
issue 8
页码: 461-463
ISSN:0003-6951
年代: 1986
DOI:10.1063/1.97116
出版商: AIP
数据来源: AIP
摘要:
Ap‐channel field‐effect transistor with a 3.5 &mgr;m Cr/Au gate was fabricated from a modulation‐doped GaAs/In0.2Ga0.8As/GaAs quantum well structure. Well‐behaved transistor action was observed at both 300 and 77 K with extrinsic transconductances of 6.2 and 11.3 mS/mm, respectively. Shubnikov–deHaas measurements prove the existence of a two‐dimensional hole gas with a strain‐shifted light‐hole ground state associated with a light‐hole mass of 0.154m0.
点击下载:
PDF
(200KB)
返 回