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p‐channel, strained quantum well, field‐effect transistor

 

作者: T. J. Drummond,   T. E. Zipperian,   I. J. Fritz,   J. E. Schirber,   T. A. Plut,  

 

期刊: Applied Physics Letters  (AIP Available online 1986)
卷期: Volume 49, issue 8  

页码: 461-463

 

ISSN:0003-6951

 

年代: 1986

 

DOI:10.1063/1.97116

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Ap‐channel field‐effect transistor with a 3.5 &mgr;m Cr/Au gate was fabricated from a modulation‐doped GaAs/In0.2Ga0.8As/GaAs quantum well structure. Well‐behaved transistor action was observed at both 300 and 77 K with extrinsic transconductances of 6.2 and 11.3 mS/mm, respectively. Shubnikov–deHaas measurements prove the existence of a two‐dimensional hole gas with a strain‐shifted light‐hole ground state associated with a light‐hole mass of 0.154m0.

 

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