Process‐property correlations of excimer laser ablated bismuth titanate films on silicon
作者:
N. Maffei,
S. B. Krupanidhi,
期刊:
Journal of Applied Physics
(AIP Available online 1993)
卷期:
Volume 74,
issue 12
页码: 7551-7560
ISSN:0021-8979
年代: 1993
DOI:10.1063/1.354981
出版商: AIP
数据来源: AIP
摘要:
Bismuth titanate thin films were deposited by the excimer laser ablation technique directly onto bare silicon substrates, SiO2and Si3N4coated silicon. The impact of process parameters such as gas pressure, laser fluence, processing temperature, and the presence of an oxygen plasma were studied with regards to the ferroelectric‐semiconductor interface. The density of interfacial surface state (Nss) at the flatband voltage was found to be on the order of 1012–1014eV−1 cm−2. Hysteretic capacitance‐voltage data indicated charge injection from the substrate was the dominant mechanism, masking any polarization mode. Films deposited on SiO2coated silicon did, however, exhibit polarization type switching.
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