Electrical characterization of PLT thin films by LP-MOCVD
作者:
Seaung-Suk Lee,
Ho-Gi Kim,
期刊:
Integrated Ferroelectrics
(Taylor Available online 1995)
卷期:
Volume 11,
issue 1-4
页码: 137-144
ISSN:1058-4587
年代: 1995
DOI:10.1080/10584589508013586
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
La-modified lead titanate(PLT) thin films were prepared on Pt/SiO2/Si substrate by hot-wall type low pressure-metalorganic chemical vapor deposition(LP-MOCVD). The films were deposited at 500°C under the low pressure of 1000mTorr. The films were annealed at 650°C for 10min with O2ambient before top-Pt electroding. Schottky emission was observed for Pt/PLT(12)/Pt capacitor. With increasing La mole%, surface morphologies of the PLT films were improved smoothly and leakage current density decreased.
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