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New high‐pressure phases of Nb3Si produced by recrystallization of metastable sputter deposits

 

作者: R. M. Waterstrat,   F. Haenssler,   J. Mu¨ller,   S. D. Dahlgren,   J. O. Willis,  

 

期刊: Journal of Applied Physics  (AIP Available online 1978)
卷期: Volume 49, issue 3  

页码: 1143-1148

 

ISSN:0021-8979

 

年代: 1978

 

DOI:10.1063/1.325053

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Threee new phases of the alloy Nb3Si have been produced by a relatively low‐temperature (∼800 °C) recrystallization anneal under pressures of up to 100 kbars. The new phases are apparently formed only when the Nb3Si starting material has a metastable body‐centered‐cubic structure which is prepared by sputtering. They are not formed when the Nb3Si starting material has the Ti3P‐type structure. One of the new high‐pressure phases has a superconducting transition temperatureTcof 5.45 K, but its crystal structure has not yet been identified. The phase formed at 60 and 100 kbars has a tetragonal Ni3P‐type structure, but the structure of the 80‐kbar phase is not known.

 

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