New high‐pressure phases of Nb3Si produced by recrystallization of metastable sputter deposits
作者:
R. M. Waterstrat,
F. Haenssler,
J. Mu¨ller,
S. D. Dahlgren,
J. O. Willis,
期刊:
Journal of Applied Physics
(AIP Available online 1978)
卷期:
Volume 49,
issue 3
页码: 1143-1148
ISSN:0021-8979
年代: 1978
DOI:10.1063/1.325053
出版商: AIP
数据来源: AIP
摘要:
Threee new phases of the alloy Nb3Si have been produced by a relatively low‐temperature (∼800 °C) recrystallization anneal under pressures of up to 100 kbars. The new phases are apparently formed only when the Nb3Si starting material has a metastable body‐centered‐cubic structure which is prepared by sputtering. They are not formed when the Nb3Si starting material has the Ti3P‐type structure. One of the new high‐pressure phases has a superconducting transition temperatureTcof 5.45 K, but its crystal structure has not yet been identified. The phase formed at 60 and 100 kbars has a tetragonal Ni3P‐type structure, but the structure of the 80‐kbar phase is not known.
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