Polymerization of Organosilicones in Microwave Discharges. II. Heated Substrates
作者:
A.M. Wrobel,
J.E. Klemberg,
M.R. Wertheimer,
H.P. Schreiber,
期刊:
Journal of Macromolecular Science: Part A - Chemistry
(Taylor Available online 1981)
卷期:
Volume 15,
issue 2
页码: 197-213
ISSN:0022-233X
年代: 1981
DOI:10.1080/00222338108066441
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
Organosilicone vapors [hexamethyldisiloxane (HMDSO), hexa-methyldisilazane (HMDSN), and hexamethylcyclotrisilazane (HMCTSN)] have been polymerized in a microwave plasma. The reaction kinetics, structure, and density of the plasma polymer films were studied as a function of substrate temperature (Ts) to 800°C, using metal or glass as the substrate.
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