Spectroscopic ellipsometry of RuO2films prepared by metalorganic chemical vapor deposition
作者:
Peter Hones,
Tobias Gerfin,
Michael Gra¨tzel,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 67,
issue 21
页码: 3078-3080
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.114870
出版商: AIP
数据来源: AIP
摘要:
Conducting thin films on RuO2were deposited on glass by metalorganic chemical vapor deposition using tris‐trifluoroacetylacetonate‐ruthenium (III) [Ru(tfa)3] as precursor. Smooth, specular, and well adherent films were grown at temperatures as low as 400 °C, if the reaction gas contained water. RuO2was the only phase detected by x‐ray diffraction. The films were investigated by spectroscopic ellipsometry in the energy range of 1.5 to 5.0 eV. Thereby, the real (&Vegr;1) and imaginary (&Vegr;2) parts of the dielectric function were determined at room temperature. The optical constants could be described by three harmonic oscillators in combination with a Drude term for free‐charge carriers. ©1995 American Institute of Physics.
点击下载:
PDF
(69KB)
返 回