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Spectroscopic ellipsometry of RuO2films prepared by metalorganic chemical vapor deposition

 

作者: Peter Hones,   Tobias Gerfin,   Michael Gra¨tzel,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 67, issue 21  

页码: 3078-3080

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.114870

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Conducting thin films on RuO2were deposited on glass by metalorganic chemical vapor deposition using tris‐trifluoroacetylacetonate‐ruthenium (III) [Ru(tfa)3] as precursor. Smooth, specular, and well adherent films were grown at temperatures as low as 400 °C, if the reaction gas contained water. RuO2was the only phase detected by x‐ray diffraction. The films were investigated by spectroscopic ellipsometry in the energy range of 1.5 to 5.0 eV. Thereby, the real (&Vegr;1) and imaginary (&Vegr;2) parts of the dielectric function were determined at room temperature. The optical constants could be described by three harmonic oscillators in combination with a Drude term for free‐charge carriers. ©1995 American Institute of Physics. 

 

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