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Electron effective masses in 4H SiC

 

作者: N. T. Son,   W. M. Chen,   O. Kordina,   A. O. Konstantinov,   B. Monemar,   E. Janze´n,   D. M. Hofman,   D. Volm,   M. Drechsler,   B. K. Meyer,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 66, issue 9  

页码: 1074-1076

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.113576

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Results from optically detected cyclotron resonance (ODCR) studies of electron effective masses in 4H SiC are reported. ODCR measurements were performed on high‐purityn‐type 4H SiC epitaxial layers grown by chemical vapor deposition at bothXband (9.23 GHz) andQband (35.05 GHz) microwave frequencies. Electron effective masses in 4H SiC were directly determined asm⊥*=0.42m0andm∥*=0.29m0. A scattering time in the basal plane &tgr;⊥≊4.3×10−11s, and hence, the corresponding electron mobility &mgr;⊥≊1.8×105cm2/V s, was obtained from a fit of the ODCR line shape. ©1995 American Institute of Physics.

 

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